Preparation of TEM plane view sections on semiconductor device using the tripod-polisher and chemical etching
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概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 2001-02-01
著者
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Maruyama Hideo
Semiconductor Device Failure Analysis Ites Co.ltd
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KATO Naoko
Semiconductor Device Failure Analysis, ITES Co.Ltd
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SAKA Hiroyasu
Semiconductor Device Failure Analysis, ITES Co.Ltd
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KATO Naoko
Structural Analysis, International Test and Engineering Services Co. Ltd
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Kato Naoko
Structural Analysis International Test And Engineering Services Co. Ltd
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Saka Hiroyasu
Semiconductor Device Failure Analysis Ites Co.ltd
関連論文
- Preparation of TEM plane view sections on semiconductor device using the tripod-polisher and chemical etching
- Electron holographic mapping of two-dimensional doping areas in cross-sectional device specimens prepared by the lift-out technique based on a focused ion beam
- Examination of electrostatic potential distribution across an implanted p-n junction by electron holography