Determination of Metallic Impurities in a Silicon Wafer by Local Etching and Electrothermal Atomic Absorption Spectrometry
スポンサーリンク
概要
著者
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Lee S‐h
Department Of Chemistry Kyungpook National University
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Kim Young-hun
R & D Center Lg Siltron Inc.
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Lee Sang-hak
Department Of Chemistry Kyungpook National University
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Kim Y‐h
R & D Center Lg Siltron Inc.
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CHUNG Hye-Young
R & D Center, LG Siltron Inc.
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KIM Young-Hun
R & D Center, LG Siltron Inc.
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LEE Ki-Sang
R & D Center, LG Siltron Inc.
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KIM Dae-Hong
R & D Center, LG Siltron Inc.
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Chung Hye-young
R & D Center Lg Siltron Inc.
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Lee Ki-sang
R & D Center Lg Siltron Inc.
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Kim Dae-hong
R & D Center Lg Siltron Inc.
関連論文
- Effects of Surface Roughness and Copper Contamination on the Oxide Breakdown of Silicon Wafer(Semiconductors)
- Observation of Micro-Oxygen Precipitates in the Vicinity of the Oxidation-Induced Stacking Fault Ring and Their Effects on Thin Gate Oxide Breakdown : Semiconductors
- Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection
- Determination of Metallic Impurities in a Silicon Wafer by Local Etching and Electrothermal Atomic Absorption Spectrometry
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