Negative-Working Photosensitive Polybenzoxazoles Based on Hyperbranched Poly(0-hydroxyamide)s
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概要
- 論文の詳細を見る
- Society of Polymer Scienceの論文
- 2003-07-15
著者
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KAKIMOTO Masa-aki
Department of Organic & Polymeric Materials, Tokyo Institute of Technology
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柿本 雅明
東京工業大学大学院理工学研究科有機・高分子物質専攻
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柿本 雅明
東京工業大学部有機材科工学科
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Hong Chi
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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JIKEI Mitsutoshi
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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Jikei M
Akita Univ. Akita Jpn
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Jikei Mitsutoshi
Department Of Material-process Engineering & Applied Chemistry Environments Akita University
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