Quantitative Depth Profiling of Argon in Tungsten Films by Secondary Ion Mass Spectrometry

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概要

• 論文の詳細を見る
• Japan Society for Analytical Chemistryの論文
• 2001-03-10

著者

• Yamazaki Hideyuki

  Toshiba Corporation Research And Development Center

関連論文

• Evaluation of the Electric Field above a Specimen Surface during SIMS Analysis
• Quantitative Depth Profiling of Argon in Tungsten Films by Secondary Ion Mass Spectrometry
• Quantitative Secondary Ion Mass Spectrometry Analysis of Carbon and Fluorine Impurities on Silicon Wafers Stored in Polymer Carrier Cases

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