Mirror-Trapped Plasma Heated by High-Power Millimeter-Wave Radiation as an Electron-Cyclotron-Resonanse Source of Soft X-Rays
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概要
- 論文の詳細を見る
- 2001-02-01
著者
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Golubev Sergey
Institute Of Applied Physics Russian Academy Of Sciences
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Zorin Vladimir
Institute Of Applied Physics Russian Academy Of Sciences
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Lopatin Alexey
Institute Of Applied Physics Russian Academy Of Sciences
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Smirnov Artem
Institute Of Applied Physics Russian Academy Of Sciences
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VODOPYANOV ALEXANDER
Institute of Applied Physics, Russian Academy of Sciences
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KRYACHKO Andrey
Institute of Applied Physics, Russian Academy of Sciences
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LUCHIN Valeriy
Institute of Applied Physics, Russian Academy of Sciences
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RAZIN Sergey
Institute of Applied Physics, Russian Academy of Sciences
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Razin Sergey
Institute Of Applied Physics Russian Academy Of Sciences
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Luchin Valeriy
Institute Of Applied Physics Russian Academy Of Sciences
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Kryachko Andrey
Institute Of Applied Physics Russian Academy Of Sciences
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Vodopyanov Alexander
Institute Of Applied Physics Russian Academy Of Sciences
関連論文
- Mirror-Trapped Plasma Heated by High-Power Millimeter-Wave Radiation as an Electron-Cyclotron-Resonanse Source of Soft X-Rays
- Mirror-Trapped Plasma Heated by High-Power Millimeter-Wave Radiation as an Electron-Cyclotron-Resonanse Source of Soft X-Rays
- Indium Nitride Film Growth by Metal Organic Chemical Vapor Deposition with Nitrogen Activation in Electron Cyclotron Resonance Discharge Sustained by 24 GHz Gyrotron Radiation
- Indium Nitride Film Growth by Metal Organic Chemical Vapor Deposition with Nitrogen Activation in Electron Cyclotron Resonance Discharge Sustained by 24 GHz Gyrotron Radiation (Special Issue : Recent Advances in Nitride Semiconductors)
- Monocrystalline InN Films Grown at High Rate by Organometallic Vapor Phase Epitaxy with Nitrogen Plasma Activation Supported by Gyrotron Radiation