A Novel Photoresist Based on Polymeric Acid Amplifiers
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概要
- 論文の詳細を見る
- 2000-09-05
著者
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PARK Sang-Wook
Chemical Resources Laboratory, Tokyo Institute of Technology
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ARIMITSU Koji
Chemical Resources Laboratory, Tokyo Institute of Technology
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LEE Sungeun
Chemical Resources Laboratory, Tokyo Institute of Technology
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ICHIMURA Kunihiro
Chemical Resources Laboratory, Tokyo Institute of Technology
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Park Sang-wook
The Dept.of Electrical And Electronic Eng.yonsei Univ.
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Lee S
Chemical Resources Laboratory Tokyo Institute Of Technology
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Arimitsu K
Tokyo Univ. Sci. Chiba Jpn
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Lee Sungeun
Chemical Resources Laboratory Tokyo Institute Of Technology
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Ichimura Kunihiro
Research Institute For Polymers And Textiles
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Ichimura Kunihiro
Chemical Researches Laboratory Tokyo Institute Of Technology
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