Silicon Dry Etching in Hydrogen Iodide Plasmas:Surface Diagnostics and Technological Applications

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1997-07-01

著者

• Aminpur Massud-a.

  Institute For Semiconductor Physics

• RICHTER Harald

  Institute for Semiconductor Physics

• ERZGRABER Heide

  Institute for Semiconductor Physics

• WOLFF Andre

  Institute for Semiconductor Physics

• KRUGER Dietmar

  Institute for Semiconductor Physics

• DEHOFF Arnulf

  SENTECH Instruments

• REETZ Martin

  SENTECH Instruments

関連論文

• Silicon Dry Etching in Hydrogen Iodide Plasmas:Surface Diagnostics and Technological Applications
• Silicon Dry Etching in Hydrogen Iodide Plasmas: Surface Diagnostics and Technological Applications

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