Optical Emission Diagnostic of Laser-Induced Plasma during CNX Film Deposition
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概要
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To investigate the characteristics of the plasma plume created by reactive laser ablation (RLA) of graphite, optical emission spectra (OES) of the ablated species were recorded for different distances from the target, for various laser fluences and for several N2 pressures. The spectra were dominated by the molecular bands of C2 and CN radical: C2 Swan and CN violet spectral systems. From the molecular band intensities the rotational and vibrational temperatures of CN radicals were derived though there is not a significant dependence of the temperature with fluence, a strong increase of intensity can be observed with the increase of the laser fluence.
- 1997-07-30
著者
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Perrone Alessio
University Of Lecce And National Nanotechnology Laboratory Of Istituto Nazionale Di Fisica Della Mat
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DINESCU Gheorghe
Institute of Physics and Technology of Radiation Devices
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Aldea Eugen
Institute of Physics and Technology of Radiation Devices, P.O. Box MG-07, 76900 Bucharest, Romania
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Caricato Anna
University of Lecce and Istituto Nazionale per la Fisica della Materia, Department of Physics,
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Luches Armando
University of Lecce and Istituto Nazionale per la Fisica della Materia, Department of Physics,
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Aldea Eugen
Institute Of Physics And Technology Of Radiation Devices
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Caricato Anna
University Of Lecce And Istituto Nazionale Per La Fisica Della Materia Department Of Physics
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Luches Armando
University Of Lecce And Istituto Nazionale Per La Fisica Della Materia Department Of Physics
関連論文
- Optical Emission Diagnostic of Laser-Induced Plasma during CNX Film Deposition
- Evaporation Source for Deposition of Protective Layers inside Tubes
- State-of-the-Art Reactive Pulsed Laser Deposition of Nitrides
- Extensive Studies of the Plume Deflection Angle During Laser Ablation of Si Target