Growth Rate Constant and Chemical Diffusivity in Silicides Mo_5Si_3 and Ta_5Si_3
スポンサーリンク
概要
著者
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OHSASA Kenichi
Faculty of Engineering, Hokkaido University
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Yanaka Hiroyuki
Hokkaido Industrial Research Institute
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Narita Toshio
Graduate School Of Engineering Hokkaido University
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Narita T
Graduate School Of Engineering Hokkaido University
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CHRISTIAN Francis
Graduate School of Engineering, Hokkaido University
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SOHMA Hideaki
Muroran Techno-Center Foundation
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TANAKA Toshiaki
Muroran Techno-Center Foundation
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OHSASA Ken-ichi
Graduate School of Engineering, Hokkaido University
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Ohsasa K
Faculty Of Engineering Hokkaido University
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Christian F
Graduate School Of Engineering Hokkaido University
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Sohma Hideaki
Muroran Techno-Center
関連論文
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- Formation of Ni Aluminide Containing Hf by Simultaneous Electrodeposition of Al and Hf and Cyclic-Oxidation Resistance
- Numerical Modeling of the Transient Liquid-phase Diffusion Bonding Process of Al Using Cu Filler Metal
- Growth Rate Constant and Chemical Diffusivity in Silicides Mo_5Si_3 and Ta_5Si_3
- Phase-field Simulation of Transient Liquid Phase Bonding Process of Ni Using Ni-P Binary Filler Metal
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