Electron-Beam Assisted Inductively Coupled Plasma for Quarter-Micron Etching Processes (特集:11th International Conference on Gas Discharges and their Applications)

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概要

• 論文の詳細を見る

著者

• Morita Shinzo

  Nagoya Univ.

• Morita S

  Nagoya University

• Inanami Ryoichi

  Nagoya University

関連論文

• Electron-Beam Assisted Inductively Coupled Plasma for Quarter-Micron Etching Processes (特集:11th International Conference on Gas Discharges and their Applications)
• Synchrotron-Radiation-Induced Deposition of Etch-Protecting Film on Si in CF_4 Plasma
• Cu Dispersed C-S Dielectric Thin Film

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