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VLSI Research Center, Toshiba Corporation | 論文
- KrF Excimer Laser Projection Lithography: 0.35μm Minimum Space VLSI Pattern Fabrication by a Tri-Level Resist Process
- Radiation Damage Evaluation in Excimer Laser Beam Irradiation and Reactive Ion Etching
- Excimer Laser Photochemical Directional Etching of Phosphorous Doped Poly-Crystalline Silicon