スポンサーリンク

ULSI Research Department, Center Research Laboratory, Hitachi, Ltd. | 論文

• Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
• Acid-breakable Resin-based Resist for Nanofabrication Electron-beam Lithography
• Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography

スポンサーリンク