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Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn | 論文
- Characterization of negative-tone molecular resist for EUV and EB lithography
- High-Speed Low-Power Ring Oscillator Using Inverted-Structure Modulation-Doped GaAs/n-AlGaAs Field-Effect Transistors
- Resist Elution Study for Immersion Lithography
- Development Status of High Performance Materials for Immersion Lithography
- Resist Characteristics with Electron Beam and SR Exposures
- Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness
- Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control
- Pattern Freezing Process Free Litho–Litho–Etch Double Patterning
- Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist
- Resist Outgassing by EUV Irradiation
- Fabrication of Aspherical Mirrors for Extreme Ultra-Violet Lithography (EUVL) Using Deposition Techniques
- A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography
- Advanced Resist Design Using AFM Analysis for ArF Lithography
- 29 TURNER SYNDROME AND XP DELETIONS : CLINICAL AND MOLECULAR STUDIES IN 47 PATIENTS
- 36 CONGENITAL ADRENAL HYPOPLASIA AND MENTAL RETARDATION : IMPORTNACE OF THE IL1RAPL GENE ANALYSIS
- 16 PREVALENCE OF SHOX HAPLOINSUFFICIENCY IN 900 PATIENTS WITH IDIOPATHIC SHORT STATURE
- 30 SHOX NULLIZYGOSITY AND HAPLOINSUFFICIENCY IN A JAPANESE FAMILY : IMPLICATION FOR THE DEVELOPMENT OF TURNER SKELETAL FEATURES.
- 66 URINE 5β/5α-REDUCED STEROID RATIO : INFLUENCE OF MUTAIONS AND POLYMORPHISM OF THE STEROID 5α REDUCTASE-2 GENE