Characterization of negative-tone molecular resist for EUV and EB lithography

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Shiono Daiju

  Tokyo Ohka Kogyo Co. Ltd. Kanagawa Jpn

関連論文

• Characterization of negative-tone molecular resist for EUV and EB lithography
• Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness
• Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control

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