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Telecommunication Basic Research Laboratory, Electronics and Telecommunications Research Institute | 論文
- Characterization of Residues on Anhydrous HF Gas-Phase Etching of Sacrificial Oxides for Surface Micromachining
- Stress Characteristics of Multilayered Polysilicon Film for the Fabrication of Microresonators
- Highly Sensitive Optical Oxygen Sensing Material: Thin Silica Xerogel Doped with Tris(4,7-diphenyl-1,10-phenanthroline)ruthenium
- Intermixing Characteristics of Strained-InGaAs/InGaAsP Multiple Quantum Well Structure Using Impurity-Free Vacancy Diffusion
- Reduced Polarization Sensitivity of Multimode Interference 1 × 4 Demultiplexers