スポンサーリンク
Semiconductor Research Center, Matsushita Electric Ind. Co. Ltd., Moriguchi, Osaka 570 | 論文
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope) : Inspection and Testing
- Submicron 3-Dimensional Structure Observation by Cyclotron SEM(Scanning Electron Microscope)
- A Novel High-Resolution Scanning Electron Microscope for the Surface Analysis of High-Aspect-Ratio Three-Dimensional Structures
- An E-Beam Direct Write Process for 16M-Bit DRAMs