スポンサーリンク
Sanyo Electric Co. Ltd. Gifu Jpn | 論文
- Crystal Growth of Low-Temperature Processed Poly-Si by Excimer Laser Annealing - Dependences of Poly-Si Grain on Energy Density and Shot Number -
- Influence of Hydrogen in a-Si on Recrystallization of Low-Temperature Processed Poly-Si Film by Excimer Laser Annealing
- Study of Crystal Growth Mechanism for Poly-Si Film Prepared by Excimer Laser Annealing
- Heavy-Metal(Fe/Ni/Cu)Behavior in Ultrathin Bonded Silicon-On-Insulator(SOI)Wafers Evaluated Using Radioactive Isotope Tracers
- Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)
- Grain Morphology of Recrystallized Polycrystalline-Si Film by Excimer Laser Annealing
- Characteristics of Recrystallized poly-Si Film Prepared by ELA of a-Si Deposited on SiO2 / SiN / Glass Using PE-CVD Method
- Characterization of Poly-Silicon Film Prepared by Excimer Laser Annealing
- Study of the Tunneling Characteristics of Ba_K_xBiO_3 Superconducting Thin Films Based on the Gap-Energy Distribution Model
- Preparation of a-Si_N_x:H Film Using N_2 Microwave Afterglow Chemical Vapor Deposition Method
- Zero-Field Magnetic Amplifying Magnetooptical System Applied to Next Generation "iD PHOTO" System
- In Situ Observation of Photon-Stimulated Hydrogen Removal on a HF-Passivated Si(111) Surface by Ultraviolet Photoelectron Spectroscopy Using Synchrotron Radiation
- Low-Temperature Cleaning of HF-Passivated Si(111) Surface with VUV Light
- Magneto-Optical Kerr Spectra of Ultrathin Co Films
- Video Disk Recorder System Using Magneto-Optical Disk
- Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor
- High-Performance a-SiGe Solar Cells Using a Super Chamber Method
- Calculation of Characteristic X-rays in Diagnostic X-ray Spectrum
- Effect of Electron Energy Distribution on Bremsstrahlung Spectrum
- Property Control for High-Quality Ba_K_xBiO_3 Epitaxial Thin Films Prepared by High-Pressure Reactive rf-Magnetron Sputtering