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Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ | 論文
- Deposition of Aluminum Nitride by Remote Plasma-Enhanced Chemical Vapor Deposition Using Triisobutyle Aluminum
- Preparation of ZnO Thin Films Deposited by Plasma Chemical Vapor Deposition for Application to Ultraviolet-cut Coating : Nuclear Science, Plasmas, and Electric Discharges
- Amorphous Silicon Avalanche Photodiode Films Using a Functionally Graded Superlattice Structure
- Amorphous Silicon Avalanche Photodiode Films Using Functionally Graded Superlattice Structure
- Gated Volcano-Shaped Field Emitters with Sharp Polycrystalline-Silicon Tips
- Growth of microcrystalline Si films in cathode-type rf GD at high SiH_4 concentration
- Preparation of Polycrystalline Silicon Thin Films by Cathode-Type RF Glow Discharge Method
- Growth of Highly Oriented Silicon Films on Si(100) and Al_2O_3(0112) by Cathode-type rf Glow Discharge Method
- Growth of Y_2O_2S:Eu Thin Films by Reactive Magnetron Sputtering and Electroluminescent Characteristics
- Characteristics of Y_2O_3:Eu/ZnS/Y_2O_3:Eu Red Light Emitting Electroluminescent Devices
- Structure and Luminescent Property of Y_2O_2S:Eu Thin Films Prepared by Magnetron Sputtering
- X-Ray Imaging Sensor Using a Polycrystalline Cadmium Telluride-Hydrogenated Amorphous Silicon Heterojunction
- Amorphous Silicon Resistive Sea for Silicon Vidicon Targets
- Green Cathodoluminescence Properties of Zinc Oxide Films Prepared by Excimer Laser Irradiation of a Sol-Gel-Derived Precursor
- Low Temperature Fabrication of Thin Film Transistors using Microcrystalline Si Deposited by Cathode-Type RF Glow Discharge
- Structure of Electrodeposited Zn-Mn Alloy Coatings
- Optimum Gas Pressure of Soft Vacuum Pyroelectric Vidicon
- Lag and Resolution Related with Current Distribution of Electron Beam in Camera Tubes
- Influence of Bonding Wire on Electron Beam in Camera Tube with NEA Cold Cathode
- 電子線励起紫外発光ZnAl_2O_4蛍光体の焼成条件依存性(発光型/非発光型ディスプレイ合同研究会)