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Power Source Technology Department Advanced Component Division Daihen Corporation | 論文
- Effect of Oxygen Additive on Microwave Plasma for Diamond Film Synthesis Studied by the Plasma Impedance Measurement
- Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave
- Effects of Oxygen Addition on Diamond Film Growth by Electron-Cyclotron-Resonance Microwave Plasma CVD Apparatus
- Preparation of As-Grown BiPbSrCaCuO Thin Films by Electron-Cyclotron-Resonance Microwave Plasma Sputtering
- Electron-Cyclotoron-Resonance Microwave Plasma Oxidation of Er_1Ba_2Cu_3O_y Superconductive Ceramics : Electrical Properties of Condensed Matter