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Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies (ASET) | 論文
- Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System
- Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
- Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma
- Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
- Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma