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Photonics Research Group School Of Electrical And Electronic Engineering Nanyang Technological Unive | 論文
- Atomic Layer Deposition - and Chemical Vapor Deposition-TiN Top Electrode Optimization for the Reliability of Ta_2O_5 and Al_2O_3 Metal Insulator Silicon Capacitor for 0.13μm Technology and Beyond
- High-Density Plasma Enhanced Quantum Well Intermixing in InGaAs/InGaAsP Structure Using Argon Plasma
- Effects of Step Coverage, Cl Content and Deposition Temperature in TiN Top Electrode on the Reliability of Ta_2O_5 and Al_2O_3 MIS Capacitor for 0.13μm Technology and Beyond
- Generation of Multiple Energy Bandgaps Using a Gray Mask Process and Quantum Well Intermixing