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Ntt Advanced Technology Corp. | 論文
- Evaluation of Information Leakage from PC Displays Using Spectrum Analyzers(Electromagnetic Compatibility (EMC))
- A Novel Non-contact Capacitive Probe for Common-Mode Voltage Measurement(Measurement and Immunity,2nd Pan-Pacific EMC Joint Meeting-PPEMC'06-)
- Two-Dimensional Weak Localization in Electron High-T_c Superconductor Nd(2-x) Ce_xCuO_y under High Magnetic Field
- Magnetoresistance Measurements of Single-Crystal LnBa_2Cu_3O_y (Ln=Ho,Dy,Eu and Y) under Pulsed High Magnetic Field
- Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing
- Tantalum Dry-Etching Characteristics for X-Ray Mask Fabrication
- Simulation of X-Ray Mask Distortion
- Ta Film Properties for X-Ray Mask Absorbers : Lithography Technology
- Ta Film Properties for X-Ray Mask Absorbers
- Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- X-Ray Mask Fabrication Using New Membrane Process Techniques
- High-Quality Organic 4-Dimethylamino-N-Methyl-4-Stilbazolium Tosylate (DAST) Crystal for Electro-Optic Measurement(Special Issue on Recent Progress in Microwave and Millimeter-wave Photonics Technologies)
- Electro-Optic Measurement Using High-Quality : 4-dimethylamino-N-methyl-4-stilbazolium Tosylate (DAST) Crystal
- X-Ray Standing Wave Analysis of GaAs/Si Interface
- X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes
- Long-Term Continuous versus Intermittent Cyclosporin : Therapy for Psoriasis
- HLA Class I and II Alleles and Susceptibility to Generalized Pustular Psoriasis : Significant Associations with HLA-Cw1 and HLA-DQB1^*0303
- Crystal Growth of Hen Egg White Lysozyme under High Pressure