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National Institute Of Advanced Industrial Science And Technology (aist) | 論文
- 25pPSB-35 First principles study of reactive ion etching (RIE) processes on iron oxide surfaces using CO ions
- Epitaxial growth of La_Ba_MnO_3 thin films on SrTiO_3 and LaAlO_3 substrates by metal-organic deposition process
- Preparation of Double-Sided YBCO Films on LaAlO_3 by MOD Using Commercially Available Coating Solution( Superconducting High-frequency Devices)
- Fabrication of Double-Sided YBa_2Cu_3O_7 Films on CeO_2-Buffered Sapphire Substrates by MOD Process( Superconducting High-frequency Devices)
- Electrical Properties of La_Ca_MnO_3 Thin Films Obtained by Metal-Organic Deposition (MOD) using Excimer Laser and Thermal Annealing
- Preparation of High-J_c YBa_2 Cu_3O_ Films on CeO_2-Buffered Yttria-Stabilized Zirconia Substrates by Fluorine-Free Metalorganic Deposition
- Large Temperature Coefficient of Resistance in La_Ca_MnO_3 Thin Films Obtained by Metal Organic Deposition Process
- Low Temperature Growth of Epitaxial La_Sr_MnO_3 Thin Films by an Excimer-Laser-Assisted Coating Pyrolysis Process
- Preparation of Epitaxial YBa_2Cu_3O_/CeO_2 Multilayer Films on Yttria-stabilized Zirconia (100) by All-Coating-Pyrolysis Process : Superconductors
- Preparation of PbTiO_3 Thin Films Using a Coating Photolysis Process with ArF Excimer Laser
- X-Ray Diffraction Studies of Epitaxial La_Sr_CoO_3 Thin Films Prepared by the Dipping-Pyrolysis Process
- Direct Conversion of Metal Acetylacetonates and Metal Organic Acid Salts into Metal Oxides Thin Films Using Coating Photolysis Process with An ArF Excimer Laser
- Direct Conversion of Titanium Alkoxide into Crystallized TiO_2 (rutile) Using Coating Photolysis Process with ArF Excimer Laser
- Epitaxial Growth of Bi_4Ti_3O_ Thin Films on LaAlO_3 (012) and MgO (100) by Dipping-Pyrolysis Process
- Preparation of Epitaxial Pb(Zr, Ti)O_3 Thin Films on Nb-Doped SrTiO_3(100) Substrates by Dipping-Pyrolysis Process
- Analyses of the Radiation-Caused Characteristics Change in SOI MOSFETs Using Field Shield Isolation
- 25aYC-11 有機グラフォエピタキシーの基板依存性から見たその成長機構(25aYC ナノチューブ・ナノワイヤ・結晶成長,領域9(表面・界面,結晶成長))
- 28pXJ-9 人工周期構造を持つ熱酸化シリコン基板上におけるsexithiopheneの面内選択配向成長(28pXJ 結晶成長,領域9(表面・界面,結晶成長))
- Synthesis and Properties of Pressureless-Sintered 3Y-TZP/Ba-M Type Ferrite In Situ Composites (特集 磁性材料の化学)
- Fabrication of Fine-Grained 3Y-TZP/β-Al2O3 Composites (特集 超微細結晶粒材料の作成と物性)