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NTT LSI laboratories | 論文
- 反射波面補正のためにイオンミリングした軟X線多層膜鏡の評価
- A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2
- Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging
- 面内磁場による非対称アニュラードットの磁化方向制御
- 軟X線顕微鏡用精密多層膜ミラーの開発
- Anomalous Anisotropic Magnetoresistance in Heavy-Fermion PrFe_4P_
- Structural and Magnetic Properties of Dy/Cr Multilayers and Bilayers Grown by Molecular-Beam Deposition
- 超薄膜における磁気物性とナノ構造の相関
- 閉磁路構造を有する磁性メモリセル
- Magnetic Property and Morphology of Fe Film Grown on Self-Organized SrTiO_3 (001) Substrate with Inclined Angle
- Resonant X-ray Scattering Study at Y K-edge in Y_Ca_xTiO_3(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Orbitally Ordered State in Y_Ca_xTiO_3 (0 < x ≤ 0.5)(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- InSb単分子層を介したV溝加工したSi(001)基板上へのInSb薄膜の成長(半導体のプロセス・デバイス(表面,界面,信頼性),一般)
- Improving X-Ray Mask Pattern Placement Accuracy by Correcting Process Distortion in Electron Beam Writing
- Tantalum Dry-Etching Characteristics for X-Ray Mask Fabrication
- Simulation of X-Ray Mask Distortion
- Ta Film Properties for X-Ray Mask Absorbers : Lithography Technology
- Ta Film Properties for X-Ray Mask Absorbers
- Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology
- Molecular-Beam Epitaxial Growth and Structures of Dy on (100) and (211)Cr Thin Films