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NTT LSI Laboratories, Nippon Telegraph and Telephone Corporation | 論文
- Influence of Effective Masses on the Oscillation of Fowler-Nordheim Tunneling in Thin SiO_2 MOS Capacitors
- Critical Dimension Measurement in Nanometer Scale by Using Scanning Probe Microscopy
- Thermal Stability of B-Doped SiGe Layers Formed on Si Substrates by Si-GeH_4-B_2H_6 Molecular Beam Epitaxy