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Microelectronics Research Labs, NEC Corp. | 論文
- Influence of Halogen plasma Atmosphere on SiO_2 Etching Characteristics : Etching
- Influence of Halogen Plasma Atmosphere on SiO_2 Etching Characteristics
- Study of Submicron SrTiO_3 Patterning
- Low-Temperature Etching of 0.2 μm Al Patterns Using a Sio_2 Mask