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Matsushita Technoresearch Inc. | 論文
- Increase of Central Ion Temperature after Carbon Pellet Injection in Ne-Seeded NBI Discharges of LHD
- 732 トンネル内の局所的温度変化によるパルス音の伝播・放射特性への影響(噴流・圧縮性流れ・音響)
- 1203 局所高温度領域をもつトンネルにおける音の伝播・放射(OS12-1 トンネルの空気力学、換気、火災(高速鉄道),OS12 トンネルの空気力学、換気、火災,オーガナイズドセッション)
- 253 トンネル内の高温度領域によるパルス音放射特性への影響(G05-4 流体騒音,G05 流体工学)
- 717 ダクト内高温度領域付加によるパルス音の放射特性への影響(流体音響・超音速流,学術講演)
- 1620 ダクト開口端からの衝撃音の放射特性
- 外部空洞部を複数並置した円形ダクトにおける放射音場特性(流体工学,流体機械)
- Multiplexing Performance of Antiferroelectric Liquid Crystal Device
- Phase Transitions in an Antiferroelectric Liquid Crystal TFMHPOBC
- Switching Properties in Antiferroelectric Liquid Crystals : Optical Applications
- Successive Phase Transitions in Antiferroelectric Liquid Crystal 4-(1-methylheptyloxycarbonyl) phenyl 4'-octylcarbonyloxybiphenyl-4-carboxylate (MHPOCBC)
- Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method
- Effects of Deposition Method on the Properties of Silicon Nitride and Silicon Oxynitride Films : Surfaces, Interfaces and Films
- Incorporation of Constituent Atoms of Transparent Conductive Films into Hydrogenated Amorphous Silicon via Gas Phase : Surfaces, Interfaces and Films
- Coagulation of In Atoms in Hydrogenated Amorphous Silicon Islands Deposited on ITO Films : Condensed Matter
- Properties of Silicon Oxynitride Films Prepared by ECR Plasma CVD Method : Surfaces, Interfaces and Films
- Hydrogen Concentration and Bond Configurations in Silicon Nitride Films Prepared by ECR Plasma CVD Method
- Analysis of Radial Electric Field Bifurcation in LHD Based on Neoclassical Transport Theory
- 30aUD-11 Upgraded 2d phase contrast imaging system for characterization of spatial profiles of low and high k turbulence on LHD
- Bifurcation of Heat Transport in High Temperature Plasma(Gases, plasmas, electric discharges, and beams)
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