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Manufacturing Development Laboratory, Mitsubishi Electric Corporation | 論文
- Role of Carbon and Hydrogen in Reactive Ion Etching of InP by Gas Mixture of Ethane and Hydrogen
- Fine Pattern Etching of W-Ti Absorber for X-Ray Mask with Electron Cyclotron Resonance Discharge Plasmas
- X-Ray Mask Fabrication Process Using Cr Mask and ITO Stopper in the Dry Etching of W Absorber
- Quarter-Micron Contact Hole Filling by Ionized Beam Deposition