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Jisso and Production Technologies Research Laboratories, NEC Corporation | 論文
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists
- Near-Field Magnetic Measurements and Their Application to EMC of Digital Equipment(Near-/Far-Field EM Absorption and Shielding)