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Hanyang Univ. Kyunggido Kor | 論文
- Degradation of Ta_2O_5 Gate Dielectric by TiCl_4-Based Chemically Vapor Deposited TiN Film in W/TiN/Ta_2O_5/Si System
- Process Technology for Next Generation Photomask
- Low Temperature (≤550℃) Fabrication of CMOS TFT's on Rapid-Thermal CVD Polycrystalline Silicon-Germanium Films
- Low Temperature(≦550℃) CMOS Thin-Film Transistors in RTCVD Poly-Si_Ge_ Films
- Hillock Formation of SnO_2 Thin Films Prepared by Metal-Organic Chemical Vapor Deposition
- Motor-Current-Based Real-Time End Point Detection of Shallow-Trench-Isolation Chemical Mechanical Polishing Process Using High-Selectivity Slurry
- Effects of Segregated Ge on Electrical Properties of SiO_2/SiGe Interface