スポンサーリンク
Graduate School of Electronic Science and Technology Shizuoka University | 論文
- Mechanism of Plasma Assisted a-SiC:H Film Deposition
- Variation of Stress and Hardness of a-Sic:H Films with Film Composition
- Remote Plasma SiO_2 Deposition by Tetraethoxysilane with Chemically and Energetically Different Atomic Species
- Photoluminescent Properties of a-SiC:H Films Deposited by Organosilanes in Remote H2 Plasma
- Superiority of O(^1D) atom for solid and gas phase reactions over O(^3P) atom
- Properties of Atomic Oxygen obtained from Thermodynamically Non-equilibrium High Temperature Plasma
- Fluorescence Properties of Cytochromes c-553 and c3
- Spectroscopic Studies of Hemes in Electron Carrier c-Type Cytochromes and Its Model Compounds
- Effects of Nitrogen and Oxygen Radicals on Low-Temperature Bio-Molecule Processing
- Optimization of Amino Group Introduction onto Polyurethane Surface Using Ammonia and Argon Surface-Wave Plasma
- Immobilization of l-Cysteine onto Poly(ethylene glycol) Polymerized by Surface-Wave Plasma
- A Wide Dynamic Range CMOS Image Sensor with Dual Charge Storage and a Multiple Sampling Technique
- 二つの電荷蓄積部をもつ画素構造と多重露出動作によるダイナミックレンジの拡大と動きひずみの軽減
- A CMOS Image Sensor for Fluorescence Lifetime Imaging Microscopy
- High-Resolution Pattern Reproduction by Cold Ultra Violet Stamping in Optical Polymeric Films
- Langmuir Probe Measuremnt of Cesium Plasma in Thermionic Energy Converter
- Effects of Illumination on Thermionic Energy Converter Characteristics
- Improved single-channel noise reduction method of speech by blind source separation(Applied Systems)
- Effects of N2-O2 gas mixture ratio on microorganism inactivation in low-pressure surface wave plasma (Special issue: Plasma processing)
- Development of Incremental Sheet Metal Forming System Using Elastic Tools : Principle of Forming Process and Formation of Some Fundamentally Curved Shapes