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Frontier Collaborative Research Center Tokyo Institute Of Technology:crest-japan Science And Tecimol | 論文
- Magneto-Optical Spectroscopy of Anatase TiO_2 Doped with Co
- High Mobility Thin Film Transistors with Trasparent ZnO Channels
- Epitaxial Growth of GaN Film on (La,Sr)(Al,Ta)_O3 (111) Substrate by Metalorganic Chemical Vapor Deposition
- Crack-free and c-Axis In-plane Aligned Superconducting Y_Ca_Ba_2Cu_3O_ Films for Terahertz Radiating Josephson Plasma Devices : Superconductors
- Stabilization Ba_2YCu_3O_ by Surface Coating with Plasma Polymerized Fluorocarbon Film : Electrical Properties of Condensed Matter
- Combinatorial Fabrication Process for a-Si:H Thin Film Transistors : Instrumentation, Measurement, and Fabrication Technology
- Oxygen Plasma Treatment of Rubber Surface by the Atmospheric Pressure Cold Plasma Torch
- Fabrication of Highly Stable and Low Defect Density Amorphous Silicon Films at Low Substrate Temperature by Plasma Chemical Vapor Deposition Assisted with Piezoelectric Vibration
- Transport Properties of SrCuO_2 Thin Films with Artificially Modulated Structures
- Production of Fullerenes by Low Temperature Plasma Chemical Vaper Deposition under Atmospheric Pressure
- Preparation of New Poly (phenylene vinylene) Type Polymers by Ni-promoted Polycondensation and Their Photoluminescent Properties
- In Situ Preparation of Superconducting Thick Films from Rapidly Quenched Bi-Sr-Ca-Oxide Films and Surface-Oxidized Cu Plate
- Recognition of the Atomic Terminating Layer in Perovskite Oxide Substrates by Reflection High Energy Electron Diffraction
- Formation of Self-Assembled Nanocrystalline Silicon Dots SiC14/H2 RF Plasma-Enhanced Chemical Vapor Deposition : Semiconductors