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Electrotechnical Laboratory, Umezono | 論文
- Preliminary Measurement of H_2 Pressure through Detection of Photoelectrons in Vacuum Range from 10^ to 10^ Pa
- Large Area Exposure in Synchrotron Radiation Lithography Utilizing the Steering of the Electron Beam in the Storage Ring
- Gold Substrates for Scanning Tunneling Microscopy of Adsorbed Species
- Effects of Electron Irradiation on Two-Dimensional Electron Gas in AlGaAs/GaAs Heterostructure
- Phase- and Wall-Locked Modes Found in a Large Reversed-Field Pinch Machine, TPE-RX
- Superconductivity in (TMTSF)_2CIO_4 and β-(BEDT-TTF)_2I_3 : III. Organics
- Synergistic Enhancement of Direct Synchrotron Radiation Etching of a Resist by a Low-Energy Oxygen Beam
- X-Ray Photoelectron Spectroscopy (XPS) Analysis of Oxide Formation on Silicon with High-Purity Ozone
- Mass- and Electron-Spectroscopic Observation of Resist Decomposition by Synchrotron Radiation
- Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS
- Dissociation of H_2 Molecule by Picosecond Laser Irradiation at 532 nm in the 1-4×10^ W・cm^ Range
- Plasma and Mode Rotations in a Reversed-Field Pinch Device, TPE-1RM20
- A New Method for Cleaning the Surface of Ultra High-Purity Iron by High-Purity Ozone Exposure and UV Irradiation
- Initial Oxidation of Si(100)2×1 by Ozone : Transition of Growth Kinetics from Adsorption to Ultrathin Film Growth