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Electrical And Computer Engineering Division Department Of Chemical Engineering Pohang University Of | 論文
- Growth and Characterization of Hf–Silicate/Al2O3 Gate Stacks Grown on Si(100) by Self-Limiting Atomic Layer Deposition
- Highly Conformal Hafnium Silicate Film Growth by Atomic-Layer Chemical Vapor Deposition using a New Combination of Precursors: Hf(OC(CH3)3)4 and Si(N(CH3)(C2H5))4
- Combinatorial Technique Applied to the Synthesis of Carbon Nanotubes : Atoms, Molecules, and Chemical Physics
- Architecture Design of Modeling & Simulation Software for Military Search and Rescue System(ICSANE 2012 (International Conference on Space, Aeronautical and Navigational Electronics))