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Department of electrical engineering, Nagaoka University of Technology | 論文
- Formation and Expansion of Ablation Plasmas Produced by Pulsed Ion Beams for Thin Films Production
- Holographic Recording in Photoreactive Monomer/Polymer Composites
- Two-Dimensional Crossed Polarization Gratings in Photocrosslinkable Polymer Liquid Crystals
- Extremely High Degree Photoinduced In-Plane Reorientation in Azobenzene-Containing Polymer Liquid Crystal Film Using 633nm Light
- Polarization Gratings in Photocrosslinkable Polymer Liquid Crystals Prepared Using Two-Step Ultraviolet Exposure
- Control of Thermally Enhanced Photoinduced Reorientation Direction of Photocrosslinkable Copolymer Liquid Crystals and Application to Polarization Gratings Using Linearly Polarized Ultraviolet Light
- Higher Order Diffraction from Polarization Gratings in Photoreactive Polymer Liquid Crystals
- Characterization of Degenerate Four-Wave Mixing in Photorefractive Polymer-Dissolved Liquid Crystal Composites
- Functionalized Mesogenic Composite for Photorefractive Applications
- Introduction to Pulse Power Producing Pulsed Ion-Beam Ablation Plasma for Propulsion Applications
- Fundamental Study of Pulsed Ion Beam Ablation Plasma Model for Space Propulsion Applications
- Determination of the Anisotropic Refractive Indices of Twisted Nematic Liquid Crystals by Means of Renormalized Transmission Ellipsometry : Instrumentation, Measurement, and Fabrication Technology
- Estrogen Secreting Adrenal Adenocarcinoma in an 18-Month-old Boy: Aromatase Activity, Protein Expression, mRNA and Utilization of Gonadal Type Promoter
- Shrinkage Effect of Local Area of Polymer Film on Adhesion Behavior
- Blister Formation at Photoresist-Substrate Interface
- Local Peeling of Photoresist Film during Ultraviolet Light Exposure
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ to Inorganic Solid Surface
- Adhesion of Photoresist Pattern Baked at 80 to 325℃ in Tetramethyl-ammonium-hydroxide Aqueous Solution
- Characterization of Surface Energetic Behavior by Atomic Force Microscopy
- Adhesion of Photoresist Micropattern to Aluminum Substrate in Alkaline Aqueous Solution