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Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology | 論文
- Effect of Crystal Defects on Laser-Induced-Damage Tolerance of Organic Crystal, 4-Dimethylamino-N-methyl-4-stilbazolium Tosylate
- Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266nm)
- Electrical Conductivity of Polymer Composites Filled with Metal
- Characterization of Two-Photon Absorption Related to the Enhanced Bulk Damage Resistance in CsLiB_6O_ Crystal
- Electrical Conductivity of Polymer Composites Filled with Carbon Black
- Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser lrradiation
- Laser-Induced Bulk Damage of Various Types of Silica Glasses at 266nm
- Effect of RF Plasma Etching on Surface Damage in CsLiB_6O_ Crystal
- Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength
- Laser-Induced Bulk Damage of Various Types of Silica Glasses at 532 and 355nm
- Ion Etching of Fused Silica Glasses for High-Power Lasers
- Bulk Laser Damage in CsLiB_6O_ Crystal and Its Dependence on Crystal Structure
- Influences of In_2O_3 Crystal Grains Formed by Annealing on Characteristics of Hexagonal InN Crystalline Films Grown on Si(111) Substrates
- Influence of Crystallinity on the Bulk Laser-Induced Damage Threshold and Absorption of Laser Light in CsLiB_6O_ Crystals : Optics and Quantum Electronics
- Fatigue level estimation of monetary bills based on frequency band acoustic signals with feature selection by supervised SOM
- Electrical Conductivity of Polymer Composites Filled with Metal
- Electrical Conductivity of Polymer Composites Filled with Carbon Black
- Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength
- Characterization of Two-Photon Absorption Related to the Enhanced Bulk Damage Resistance in CsLiB6O10 Crystal
- Effect of Crystal Defects on Laser-Induced-Damage Tolerance of Organic Crystal, 4-Dimethylamino-N-methyl-4-stilbazolium Tosylate