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Department of Electronic Engineering, Faculcy of Engineering, Kitami Institute of Technology | 論文
- Stoichiometry of Ta-N Film and Its Application for Diffusion Barrier in the Al_3Ta/Ta-N/Si Contact System
- Interaction of Al_3Ta Intermetallic Compound Film with Si : Surfaces, Interfaces and Films
- Preparation and Characterizations of Al_3Ta Intermetallic Compound Films : Surfaces, Interfaces and Films