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Department of Electronic Engineering, College of Engineering, Chubu University | 論文
- Verification of Sheath Potential of Processing Plasma in an Electron-Beam-Excited Plasma Apparatus Using a Current Balance Equation
- Sheath Potential in the Accelerating Region of an Electron-Beam-Excited Plasma Apparatus
- Production of High-Density Plasmas in Electron-Beam-Excited Plasma Device ( Plasma Processing)
- Effect of Argon Atmosphere on Self-Absorption of a Spectral Line in Laser Microprobe Analysis
- Application of Laser-Induced Plasma Spectroscopy to the Rapid Screening of Plastics for Heavy Metals
- Quantitative Analysis of Trace Lead in Tin-base Lead-free Solder by Laser-Induced Plasma Spectroscopy in Air at Atmospheric Pressure
- Correction of the Spherical Aberration of the Objective Lens in a Conventional Transmission Electron Microscope by Means of a Foil Lens
- Threshold and Energy Distribution for ECR Discharge Plasma Source
- Development of a Circularizer for an Endless Mirror Device with l=2 and l=3 Helical Systems
- Control of the Two-Electron-Temperature Plasma Parameter in a DP Device
- Formation and Deformation of Multiwall Carbon Nanotubes in Arc Discharge
- Amorphous Carbon Fibrilliform Nanomaterials Prepared by Chemical Vapor Deposition
- Excitation of Azimuthally Propagating Ion-Cyclotron Drift Waves in Large Magnetized Plasma : Nuclear Science, Plasmas and Electric Discharges