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Department of Electrical and Electronic Engineering, Saga University, | 論文
- Sheath structure of the oscillating substrate in a collisionless plasma
- Annealing Behavior of HF-Treated GaAs Capped with SiO_2 Films Prepared by 50-Hz Plasma-Assisted Chemical Vapor Deposition
- Measurements of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation
- Potential Oscillations in an Electronegative Plasma Driven by an Asymmetry RF Discharge