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Department of Electrical Engineering and Computer Science, Nagoya University | 論文
- Dechuck Operation of Coulomb Type and Johnsen-Rahbek Type of Electrostatic Chuck Used in Plasma Processing
- Dependences of Giant Magnetoresistance in Co/Cu Multilayers on Sputtering Conditions
- Multiple consultations and polypharmacy of patients attending geriatric outpatient units of university hospitals
- Refolding of Fully Reduced Bovine Pancreatic Trypsin(BIOCHEMICAL ENGINEERING)
- A Novel Bi-Metal Ni^Cd^ Supramolecular Structure with 4-Hydroxypyridine Ligands, [{Cd^(4-OHpy)_2}{Ni^(CN)_4}], and Deprotonated 3-Hydroxypyridine Ligands, [{Cd^_3(3-O^-py)_2(mea)_2}{Ni^(CN)_4}_2]
- Synthesis of Platinum Nanoparticles on Two-Dimensional Carbon Nanostructures with an Ultrahigh Aspect Ratio Employing Supercritical Fluid Chemical Vapor Deposition Process
- Control of Electric Conduction of Carbon Nanowalls
- Electrical Characterization of Carbon Nanowalls
- Silicon Wafer Orientation Dependence of Metal Oxide Sermiconductor Device Reliability
- Arc parameters around current zero in CO2-blast quenching chamber and their dependences on filled pressure (特集 アークプラズマ・電気接点とその応用)
- Two-Dimensional Distributions of Ti and Ti^+ Densities in High-Pressure Magnetron Sputtering Discharges
- Multi-Route Coding in Wireless Multi-Hop Networks
- Influence of ADC Nonlinearity on the Performance of an OFDM Receiver
- Dislocation Density and Critical Current Density of Sm_Ba_Cu_3O_y Films Prepared by Various Fabrication Processes
- c-Axis-Correlated Vortex Pinning Center Induced by Dilute Co-doping in Pulsed-Laser-Deposition-ErBa_2Cu_3O_y Films
- Enhancement of Flux-Pinning in Epitaxial Sm_Ba_Cu_3O_y Films by Introduction of Low-T_c Nanoparticles
- High-Critical-Current-Density SmBa_2Cu_3O_ Films Induced by Surface Nanoparticle
- Growth Processes of Nanoparticles in Liquid-Phase Laser Ablation Studied by Laser-Light Scattering
- Effect of Pressurization on the Dynamics of a Cavitation Bubble Induced by Liquid-Phase Laser Ablation
- Temporal Variations in Densities of Y, Ba, and Cu Atoms in Magnetron Sputtering Plasmas with YBaCuO Target