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Department Of Semiconductor Engineering Cbnu | 論文
- Fabrication and Characterization of Ru Thin Films Prepared by Liquid Delivery Metal-Organic Chemical Vapor Deposition
- Impact of NF3-Added Interlayer Dielectric High Density Plasma Process on Hump Effect in Submicron n-type Metal Oxide Silicon Field Effect Transistor
- Low Power Clock Gating for Shift Register
- Preparation and Characterization of RuOx Thin Films by Liquid Delivery Metalorganic Chemical Vapor Deposition