スポンサーリンク
Department Of Materials Technology Chiba University | 論文
- Improvement in Performances of ZnO : B/i-ZnO/Cu(InGa)Se_2 Solar Cells by Surface Treatments for Cu(InGa)Se_2
- Beating of the Shubnikov-de Haas Oscillations in GaAs/AlGaAs Quantum-Dot Arrays
- Modeling of Electron Transport in Corrugated Quantum Wires
- Ballistic Weak Localization and Wave Function Scarring in Quantum Wires
- Growth, Electric and Thermal Properties of Lead Scandium Niobate-Lead Magnesium Niobate-Lead Titanate Ternary Single Crystals
- GaAs Pseudo-Heterojunction Bipolar Transistor with a Heavily Carbon-Doped Base
- Theoretical Analysis of Heavy Doping Effects on AlGaAs/GaAs HBT's
- Effect of Heavy Doping on Band Gap and Minority Carrier Transport of AlGaAs/GaAs HBT's (SOLID STATE DEVICES AND MATERIALS 1)
- Molecular Orientation of Liquid Crystalline Polymer Films Fabricated by Polarized-Laser Chemical Vapor Deposition
- Anisotropic Molecular Orientation of Poly(o-trimethylsilyl)-Phenylacetylene Film Swollen under High Magnetic Field
- Challenge of Near-Field Recording beyond 50.4 Gbit/in^2
- Near-Field Optical Recording on a Pre-Grooved Phase-Change Disk in the Blue-Violet
- Near-Field Phase-Change Optical Recording of 1.36 Numerical Aperture
- Energy Quenching Effects on Dry-Etching Durability of Alicyclic-Aliphatic Copolymers and Polymer Blends Enhanced by Polymer-Chain Entanglement
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Electron and Hole Proximity Effects in the InAs/AlSb/GaSb System
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography : I.Limited Permeation of Si Compounds from Vapor Phase