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Department Of Electrical Engineering And Computer Science Nagoya University | 論文
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma
- Removal of Water Pollutants by Pulsed Discharge Plasma and Observation of Its Optical Emission Intensity at Atmospheric Pressure
- Influence of Oxygen Addition and Wafer Bias Voltage on Bromine Atom Surface Reaction in a HBr/Ar Inductively Coupled Plasma (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Effect of Water Pressure on Size of Nanoparticles in Liquid-Phase Laser Ablation
- Predominant Particles in SF₆-CO₂ Mixture at Temperatures of 300-30,000K (特集 開閉保護技術)
- High-Temperature Properties of CO2 Mixed with N2:—Comparison to CO2 Mixture with O2—
- Emission Cross Sections of the Fragments in Dissociative Excitation of Germane by Electron Impact
- A Simple Method for Efficient Generation of Standing Cavitation Bubbles
- Effect of N2 and O2 Additions to CO2 on Extinction Limitation of Axial Gas Flow Arc
- Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes (Special Issue : Dry Process)
- Removal of Water Pollutants by Pulsed Discharge Plasma and Observation of Its Optical Emission Intensity at Atmospheric Pressure (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Generation of Widely and Flatly Broadened, Low-Noise and High-Coherence Supercontinuum in All-Fiber System
- Hydrogen Release and Retention Dynamics of Amorphous Carbon Layers Exposed to a Hydrogen/Helium Plasma
- Optical-Fiber-Type Broadband Cavity Ring-Down Spectroscopy Using Wavelength-Tunable Ultrashort Pulsed Light
- Temperature Rise of Workpiece During Metal Cutting
- The helical flow pump with a hydrodynamic levitation impeller
- Limits of Thread-Level Parallelism in Non-numerical Programs
- Supercritical Fluid Deposition of High-Density Nanoparticles of Photocatalytic TiO_2 on Carbon Nanowalls