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Department Of Electrical And Electronic Engineering Saga University | 論文
- Reactive Ion Etching of Indium Nitride Using CH_4 and H_2 Gases
- Low-Temperature Growth of InN Films on (111)GaAs Substrates
- Growth of Tungsten Films on Tool Steel Substrates by rf Magnetron Sputtering
- Crystal Structure and Orientation of Al_xIn_N Epitaxial Layers Grown on (0001) α-Al_2O_3 Substrates
- Growth of Low-Resistivity n-Type ZnTe by Metalorganic Vapor Phase Epitaxy
- Characteristics of Microwave Plasma and Preparation of a-Si Thin Film
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
- Measurement of Electron Energy Distribution Function in a Low-Pressure rf Discharge Plasma
- Distribution of P300 and SRC-1 in the Rat Brain
- Real-Time Imaging of Corticosteroid Receptor Dynamics in Living Cells with a Green Fluorescent Protein and its Spectral Variants
- Influence of Applying Bias Voltage on Diamond Nucleation while Changing the Experimental Condition
- Laser-Induced Fluorescence Study of Penning Collision of Hel 2^1S Atom with Xe in He+Xe Gas Discharge Plasma : Waves, Optics and Quantum Electronics
- Enhanced Light Output from ZnTe Light Emitting Diodes by Utilizing Thin Film Structure
- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- Characteristics of Hole Plasma in the Presence of Ion Beam Injection
- Temporal Behavior of Charged Particles in a Radio Frequency Afterglow Plasma Containing Negative Ions
- Ion Collection by a Hollow Probe in ECR Microwave Plasma under a Divergent Magnetic Field
- Inductively Coupled Plasma by means of a Novel External Antenna
- Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases
- Development of Compact Ozonizer by Barrier Discharge for High Concentration Ozone Generation