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Advanced Device Development Dept. Renesas Technology Corp. | 論文
- Measurement of Fast Electron Velocity Distribution Function in a Reversed Field Pinch Plasma
- A Novel CMOS Structure with Polysilicon Source/Drain (PSD) Transistors by Self-Aligned Silicidation (Special Issue on Sub-Half Micron Si Device and Process Technologies)
- A Robust Silicon-on-Insulator Static-Random-Access-Memory Architecture by using Advanced Actively Body-Bias Controlled Technology
- Electrical Characteristics and Crystal Quality Analysis of Thin-Body $\langle 100\rangle$ Channel Silicon-on-Insulator Metal–Oxide–Semiconductor Field-Effect Transistors Using Two-Step Elevated Silicon Epitaxial Process
- W-Polymetal Gate with Low W/Poly-Si Interface Resistance for High-Speed/High-Density Embedded Memory