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横浜国大 大学院工学研究院 | 論文
- High-Quality, High-Rate SiO_2 and SiN Films Formed by 400 kHz Bias Electron Cyclotron Resonance-Chemical Vapor Deposition
- Mask Error Factor in Proximity X-Ray Lithography
- Optimum Phase Condition for Low-Contrast X-Ray Masks
- 流動する水道水中の鋼にエレクトロコーティングを形成させるカソード分極条件
- 鋼製水路内面の局部腐食深さ分布と腐食電位の関係
- 極値統計の適用性評価における留意点および局部腐食深さデータの活用
- 2003A-OS2-5 大骨端部における構造詳細が疲労き裂発生・伝播挙動に与える影響(オーガナイズドセッション(OS2):経年船の保全技術)
- 2003S-G2-2 疲労き裂伝播解析のための自動メッシュ生成手法の開発 : 四角形メッシュ生成における要素形状の改善手法について(一般講演(G2))
- Classification of Inhomogeneities in Hydrogenated Amorphous Silicon
- Medium-Range Order of Amorphous Silicon Germanium Alloys : Small-Angle X-Ray Scattering Study
- Chemical Vapor Deposition of a-Si:H Films Utilizing a Microwave Excited Ar Plasma Stream
- Growth and Stability of H_2-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- 1-4 Application of Micro-Genetic Algorithm (μGA) to the Optimal Design of Lifting Bodies
- Effect of Ar + O_2 Plasma Etching on Microwave Characteristics of YBa_2Cu_3O_ Based Resonators
- Microwave Properties of Y_1Ba_2Cu_3O_ Step-Edge Josephson Junction Series Arrays
- Characteristics of YBCO Josephson Junction Prepared by a Focused Ion Beam Technique
- X-Band Mixing Performance of Y_1Ba_2Cu_3O_ Step-Edge Junction
- I-V Characteristic of YBCO Step-Edge Josephson Junction (Special Section on Superconducting Devices)
- Effects of Excited Species in Electron Cyclotron Resonance Plasma on SiN Film Resistivity