Hong Lan | Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
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- Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japanの論文著者
Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan | 論文
- Alkylsilane Self-Assembled Monolayer Photolithography: Effects of Proximity Gap on Photodegradation and Patterning Resolution
- 2P-330 青色蛍光シリコンナノクリスタルによる生物医学的な実験および診断(バイオイメージング(1),第46回日本生物物理学会年会)
- Patterning of Self-assembled Thin Films Using Vacuum Ultraviolet Irradiation Through Anodic Porous Alumina Mask
- Organic Monolayers Covalently Bonded to Si as Ultra Thin Photoresist Films in Vacuum UV Lithography
- Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography