Kakushima Kuniyuki | Frontier Research Center, Tokyo Institute of Technology, Yokohama 226-8502, Japan

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概要

関連著者

Yasuda Tetsuji
National Institute Of Advanced Industrial Science And Technology
IWAI Hiroshi
Interdisciplinary Graduate School of Science and Technology, Tokyo Institute of Technology
Urabe Yuji
National Institute Of Advanced Industrial Science And Technology
Kouda Miyuki
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan
Ozawa Kenji
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan
Kakushima Kuniyuki
Frontier Research Center, Tokyo Institute of Technology, Yokohama 226-8502, Japan
Ahmet Parhat
Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
Yasuda Tetsuji
National Institute for Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan

著作論文

Preparation and electrical characterization of CeO2 films for gate dielectrics application: comparative study of chemical vapor deposition and atomic layer deposition processes (Special issue: Dielectric thin films for future electron devices: science and

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