Harada Yoshinao | ULSI Process Technology Development Center, Matsushita Electronics Corp.
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- 同名の論文著者
- ULSI Process Technology Development Center, Matsushita Electronics Corp.の論文著者
ULSI Process Technology Development Center, Matsushita Electronics Corp. | 論文
- Initial Stage of Oxidation of Si(001)-2 × Surface Studied by X-Ray Photoelectron Spectroscopy
- Initial Stage of Oxidation of Si(001)-2x1 Surface Studied by X-Ray Photoelectron Spectroscopy
- Impact of Structural Strained Layer near SiO_2/Si Interface on Activation Energy of Time-Dependent Dielectric Breakdown
- Metal-Organic Chemical Vapor Deposition of HfO_2 by Alternating Supply of Tetrakis-Diethylamino-Hafnium and Remote-Plasma Oxygen
- Metalorganic Chemical Vapor Deposition of HfO_2 Films through the Alternating Supply of Tetrakis(1-methoxy-2-methyl-2-propoxy)-Hafnium and Remote-Plasma Oxygen