Watanabe Takeo | Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan
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- 同名の論文著者
- Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japanの論文著者
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Koto, Kamigori, Akou-gun, Hyogo 678-1205, Japan | 論文
- Development of Extreme Ultraviolet Interference Lithography System
- Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist
- Dual Grating Interferometric Lithography for 22-nm Node
- Development of Low Line Edge Roughness and Highly Sensitive Resist for Extreme Ultraviolet Lithography
- Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below